J(Si,H) Coupling Constants of Activated Si-H Bonds

dc.contributor.author	Eichele, Klaus
dc.date.accessioned	2019-04-24T12:34:47Z
dc.date.available	2019-04-24T12:34:47Z
dc.date.issued	2017
dc.identifier.issn	1089-5639
dc.identifier.uri	http://hdl.handle.net/10900/88024
dc.language.iso	en	de_DE
dc.publisher	Amer Chemical Soc	de_DE
dc.relation.uri	http://dx.doi.org/10.1021/acs.jpca.7b05830	de_DE
dc.rights	info:eu-repo/semantics/closedAccess
dc.subject.ddc	530	de_DE
dc.subject.ddc	540	de_DE
dc.title	J(Si,H) Coupling Constants of Activated Si-H Bonds	de_DE
dc.type	Article	de_DE
utue.quellen.id	20190131163842_01095
utue.publikation.seiten	7219-7235	de_DE
utue.personen.roh	Meixmer, Petra
utue.personen.roh	Batke, Kilian
utue.personen.roh	Fischer, Andreas
utue.personen.roh	Schmitz, Dominik
utue.personen.roh	Eickerling, Georg
utue.personen.roh	Kalter, Marcel
utue.personen.roh	Ruhland, Klaus
utue.personen.roh	Eichele, Klaus
utue.personen.roh	Barquera-Lozada, Jose E.
utue.personen.roh	Casati, Nicola P. M.
utue.personen.roh	Montisci, Fabio
utue.personen.roh	Macchi, Piero
utue.personen.roh	Scherer, Wolfgang
dcterms.isPartOf.ZSTitelID	Journal of Physical Chemistry A	de_DE
dcterms.isPartOf.ZS-Issue	38	de_DE
dcterms.isPartOf.ZS-Volume	121	de_DE
utue.fakultaet	07 Mathematisch-Naturwissenschaftliche Fakultät	de_DE